R&D Engineering, Sr Staff Engineer

This position provides the opportunity to be part of the Mask Synthesis team. We are responsible for designing and developing software tools used by the major semiconductor companies in the world. It includes modeling, Optical Proximity Correction, and Inverse Lithography technologies proven in production at advanced technology nodes. A successful candidate will be expected to have commitment to write efficient and robust software programs by following industry best practices. They should be result motivated with passion to work on large scale distributed software system that manipulate images and geometry based graphical data, and technically drive cross-functional projects.

Responsibilities:

• Design and implement efficient data structures and algorithms in the field of computational geometry, image processing, linear and non-linear optimization.
• Create application code to facilitate the extension and manipulation of Mask Synthesis tools. These include OPC, ILT, pattern matching, and lithography verification.
• Collaborate and develop new algorithms. Provide practical, manufacturing-ready solutions.
• Develop understanding of new application requirements. Write design and specification documents.
• Troubleshoot and debug issues. Document and maintain software functionality.
• Drive cross-organization projects, create scalable and reusable software. Collaborate with members from other teams.

Qualifications:

• Masters/PhD in CS, EE, or related engineering field. 8+ years of software development experience.
• Proficiency in developing and debugging C/C++ based applications in a Unix/Linux environment. Experience with Python or other script-level language. Familiarity with CUDA is highly preferred.
• Experience with software architecture and API design. Great problem-solving skills and quick learner. Structured and organized.
• Experience working in cross-functional groups and collaborative software development environment.
• Exposure to building software tools for image processing, computer vision or optical lithography.